Enhanced PB3^TM Educational, Training and R&D 

Plasma & Sputtering Systems  

The ENHANCED PB3^TM Tabletop Plasma System offers additional features over the BASIC PB3 model. These include an enclosed 19" cabinet upon which the vacuum process chamber is mounted. All electronics as well as the gas control system mount inside this enclosure. Additional room is provided above the electronics (but still inside) to enclose the optional rotating substrate holder or other accessories that may hang from the bottom flange of the vacuum chamber. 

Enhanced PB3 Tabletop Plasma System PN 00003701

This system includes these standard components:

• 6" diameter stainless, 4 way cross vacuum process chamber with NW160 ISO flanges

• Sturdy aluminum base plate/yoke chamber mounting (on top of electronics cabinet)

• KF40 pump port

• Convectron vacuum gauge with digital display

• Front mounted access door with 4" diameter float glass view port 

• Manually operated 1/4" toggle vent valve 

• Manually operated 1/4" process gas needle and shutoff valves

• 4" diameter adjustable height, grounded substrate holder (no rotation)

• 19" wide X 26" deep X 18" tall electronics rack enclosure

Select the following options to configure the system: (click on the link to go to the component web page)

      Fittings and Components

• KF40 inline, stainless/viton, butterfly valve (for pumping speed control) PN 00003439

• KF40 inline, aluminum/viton, butterfly valve (for pumping speed control) PN 00003685

• KF40 inline, stainless/fluorocarbon, inline poppet valve (for isolating the chamber) PN 00003699

• KF40 90 degree stainless EL PN 00008119

• KF40 centering ring aluminum/Viton PN 00008116

• KF40 hinged clamp with wingnut PN 00008117

• NW160 double claw clamps PN 00008329

• NW160 flange seal, aluminum/Viton PN 00008330

• NW160 blank flange, aluminum PN 00003528

• NW160 blank flange, stainless PN 00008307

• Rotating/biased substrate stage PN 00003440

      RF Power Systems ( 13.56MHz) 

• Model PB3-100MD Integrated RF generator rated 100 watts (for use with magnetron sputtering or substrate bias sources) PN 04-140087-01

• Model PB3-300MD Integrated RF generator rated 300 watts (for use with magnetron sputtering or substrate bias sources) PN 04-140087-00

• Model PB3-300D RF generator (No internal match) rated 300 watts (for use with high density plasma sources) PN 04-140032-01

• Model Helius H30013 RF generator rated 300 watts (for use with magnetron sputtering - add a matching network - or high density plasma sources)  PN 00800190

• Model Helius H60013 RF generator rated 600 watts (for use with magnetron sputtering  - add a matching network - or high density plasma sources) PN 00001183

• Model Helius H1K13 RF generator rated 1000 watts (for use with magnetron sputtering  - add a matching network - or high density plasma sources) PN 00800191

• Model MTK600L manually adjusted impedance matching network (for use with 300 & 600 watt Helius RF generators and magnetron sputtering sources) PN 00003695

• Model MTK1000L manually adjusted impedance matching network (for use with 1000 watt Helius RF generators and magnetron sputtering sources) PN 00003698

   

      Plasma Sources

• 4" diameter magnetron sputtering cathode head PN 00003688

• 2" diameter magnetron sputtering cathode head PN 00003692

• Sputtering target materials - discuss with factory

• Delta Glow^TM integrated downstream plasma source head PN 00003694

• Capacitive plasma etch head PN 00002515

• Flat coil ICP plasma etch head PN 00003700

The user will be required to furnish the following facilities:

• 190>240 VAC 50/60 Hz AC mains input (current demand based on power supply selection)

• Process gas bottle, regulator, 1/4" tubing to connect to the system

• Dry air or additional bottled gas for venting, 1/4" tubing to connect to the system

• Flat tabletop surface upon which to sit the system

• House exhaust to remove ozone when using the Delta Glow plasma source

The user will be required to furnish these additional components to complete the system:

• Rough vacuum pump 

• Miniature turbo pump (for high vacuum applications)

• Vacuum bellows or plastic hose to connect the pump to the KF40 fitting on the vacuum chamber

Typical spare parts are listed below - please contact the factory for a quote on specific part numbers for your system.

• Float glass view port & o-ring
• Sputtering target material
• O-ring and flange seals

Call 203.270.8797 to speak with a Manitou engineer about your application, or send us an e-mail. We’ll help you select the right model for your application.

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Manitou Systems Inc.
18 Commerce Road, Newtown, CT. 06470
Tel.203.270.8797 Fax.203.270.8786

This website has been revised as of 03.25.07

Any technical specification described on this website is subject to change without prior notice.

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All Rights Reserved 2007, Manitou Systems, Inc. 18 Commerce Road, Newtown, CT. 06470