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Helius Scientific RF Amplifiers
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Series PB3TM Educational, Training and R&D Plasma & Sputtering Systems
The PB3TM Tabletop Plasma System provides the user with a basic vacuum process system building block. Configure your development tool with an optional plasma source, power supply and substrate holder to complete the system. The user simply adds a vacuum pump, process gas and you are ready to process !
The system is available in two configurations: The "Basic PB3" that is built on our Model PB3 RF power system and the additionally featured "Enhanced PB3" version that is built upon a 19" tabletop electronics cabinet.
The thin film process is determined by the plasma source type installed in the system. A magnetron sputtering cathode will enable the user to perform PVD (physical vapor deposition). The use of a Delta GlowTM plasma source will enable plasma etching and surface enhancement processes. Film composition can be controlled using the optional, rotating substrate bias stage.
Additional instrumentation may be added to the system by specifying unique vacuum feed throughs or through the use of the optional side mounted 2.75" Conflat flanges.
The images below are of the "Basic PB3 magnetron sputtering system"
Click here for information and specifications for the "Basic PB3TM Plasma System
Click here for information and specifications for the "Enhanced PB3TM Plasma System Home |
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Systems Inc.
This website has been revised as of 03.25.07
Any technical specification described on this website is subject to change without prior notice.
Thank you for visiting the Manitou Systems, Inc. website. Our privacy policy is simple: we collect no personal information about you unless you choose to provide that information to us. We do not give, share, sell or transfer any personal information to a third party.
All Rights Reserved 2007, Manitou Systems, Inc. 18 Commerce Road, Newtown, CT. 06470 |
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