DELTA GLOW™ RF PLASMA SOURCES

Produce higher quality thin films
The Delta Glow family of high density RF plasma sources is designed to generate a continuous dense gas plasma for thin film deposition, etching, and material surface modification applications. A combination of proprietary plasma excitation circuitry and simple construction techniques enable Delta Glow to provide an economical and reliable high-energy down stream plasma process engine.

Delta Glow significantly improves the quality of thin films by reducing contaminants and deposited film inclusions. Delta Glow also reduces oxygen contamination that conventional techniques fail to detect and remove. When the Delta Glow high energy plasma source is used to clean a vacuum system, the bombardment of system surfaces with electrons and ions stimulates desorption of water bonded to system surfaces, resulting in a cleaner system with less film contamination during subsequent processing.

Delta Glow’s rugged construction enables use in most industrial environments. All mechanical components are constructed from chemically treated aluminum and stainless steel. RF components are 100% silver-plated for enhanced conductivity, and dielectric parts are manufactured from virgin grade PTFE and ceramics.

Standard Models

• Model DG-Integrated is a new addition to the family. This is a complete plasma source module including a 600 watt 13.56MHz RF power generator, manually adjustable impedance match and an ICP type plasma reactor tube. Designed to be installed directly on the process chamber, this plasma source can be configured for either upstream or downstream processes. All controls are remoted through the use of an analog I/O port. 

• Model DG-80 is the physically smallest of the family and is typically used for cleaning and pre-conditioning on vacuum chamber load locks. 

 

• Model DG-300 is our mid-sized model and is used to complement larger chamber volumes. The DG-300 can be used individually or in linear/annular clusters to provide large area processing capability.

  

  Instructions for configuring your own DG300 plasma source system

 

• Model DG-600 is the largest unit available and is typically used in research/development applications where an entire sample is placed into the process zone.

 

 

OEM & Custom Versions

Manitou Systems will work with the user to define an application specific RF plasma source. This custom design will combine standard Manitou sub-systems and components in a single enclosure. We will first integrate the process tube, vacuum sealing structure and enclosure onto a rugged base plate. A choice of industry standard vacuum fittings as well as custom flanges can be used to connect it to the vacuum chamber. Based on the customer specification, this design can include additional modules such as an impedance matching network and complete RF power generator. 

Our designs will easily accommodate many different mounting choices. Specialized bracketing and mounting points enable the finished unit to become an integrated part of the user's system.    

Manitou will optimize it's design around process tube materials such as quartz and alumina. Our proprietary vacuum sealing technology will accommodate standard elastomers like Viton in addition to advanced sealing materials such as Chemrez & Kalrez. 

Product reliability and a high MTBF rating are accomplished by utilizing both forced air and water to cool critical heat generating components. Typical designs use water to maintain the lowest possible temperature around o-ring seals and power conversion semiconductors. Chemically treated aluminum sheet and machined parts are used in the construction of the enclosure insuring proper RF conductivity and shielding.

Applications

• Thin film chemical vapor deposition
• Vacuum chamber cleaning and conditioning
• Load lock vacuum chamber conditioning
• O2 radical generation
• Reactive sputter deposition
• Plasma etching
• Plasma process chamber cleaning
• Polymer materials surface enhancements and modifications
• Pass through plasma processing
• Powder substrate surface treatments
• Production tool to ignite & test gaseous lamps
• Exhaust gas abatement

RF Power System Options
The Delta Glow system is furnished with its own RF power delivery system including a choice of matching networks and RF power generators. The multi-featured Helius 13.56 & 80 MHz RF generators include process power ramping, RF ON timer and continuous or pulsed output waveforms. A fully automatic or manually adjusted impedance matching network may be used to complete the RF power delivery system. For low budget applications, Manitou Model PB-3 power system may be used which includes a built-in matching network.

Delta Glow Installation
The plasma source is housed in a single, compact enclosure designed to be mounted to the vacuum process chamber. (In some applications, Delta Glow is used as a pass through plasma source and it actually becomes the process chamber.) Vacuum chamber interfacing is accomplished through an industry standard KF-50 vacuum flange or a custom interface plate. Process gas enters the reactor tube via a VCR fitting. The plasma source comes standard with a quartz reactor tube and Viton™ o-ring seals. however, aggressive fluorine-based processes may require the use of an optional alumina reactor tube and Calrez™ seals. The reactor tube and seals are the only consumable parts and may be easily replaced. Accessories may be ordered to automate and complete installation of Delta Glow.

Manitou Systems Proprietary Technologies

Manitou Systems utilizes the following proprietary technologies in the design and development of it's Delta Glow RF plasma sources.

• Process tube sealing techniques and hardware
• RF antenna construction and materials.

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Manitou Systems Inc.
33 Ball Pond Road, Danbury, CT. 06810
Tel.203.733.2110 Fax.203.746.1459

This website has been revised as of 12.13.09

Any technical specification described on this website is subject to change without prior notice.

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